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Structural properties of weakly absorbing highly conductive SiC thin films prepared in a TCDDC system

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2 Author(s)
Willeke, G. ; IMEC, Leuven, Belgium ; Martins, R.

Diffraction and other structural measurements on n-type SiC thin films prepared in a TCDDC (two consecutive decomposition and deposition chamber) system indicate the presence of Si microcrystals (without evidence for SiC crystallites). Weakly absorbing, highly conductive layers ( sigma >or=10-1 ( Omega -cm)-1) contain up to 20 at.% C and 25 at.% O. The optoelectronic properties of these films can be explained in terms of a sufficient volume fraction (above the percolation threshold) of Si microcrystals surrounded by an a-Si:C,O,H matrix.

Published in:
Photovoltaic Specialists Conference, 1988., Conference Record of the Twentieth IEEE

Date of Conference: 1988

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