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A 64 kbit fully static MOS RAM which contains about 402500 elements on the chip area of 5.44/spl times/5.80 mm has been designed. The memory cell is a basic cross-coupled flip-flop with four n-MOSFETs and two polysilicon load resistors. The memory cell size is decreased to 16/spl times/19 /spl mu/m (304 /spl mu/m/SUP 2/) by using advanced n-MOS technology with double-level polysilicon films and photolithography of 2 /spl mu/m dimensions. By applying n-well CMOS technology fabricated on a high-resistivity p-type silicon substrate to peripheral circuits of the RAM, high performance characteristics with high speed access times and low power dissipation are obtained. The RAM is designed for single 5 V operation. Address and chip select access times are typically 80 ns. Power dissipation in the active and standby mode is typically 300 and 75 mW, respectively.