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The development of reliable, high-brightness, temperature-field (TF) emission electron guns promises greater flexibility in electron-beam lithography. Detailed pattern analysis of two IC mask sets was performed for the purpose of identifying those areas of electron-beam lithography where high-brightness guns could be applied to advantage. Potential exists for throughput improvement in both Variable Shaped Spot (VSS) Vector Scanning Systems and in ultra-high-speed Raster Scanning Systems.
Date of Publication: Aug. 1980