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Improvement of microscopic and macroscopic uniformity in 4-inch InP substrate for IC application by vertical boat growth

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6 Author(s)
Kawase, T. ; Sumitomo Electr. Industries Ltd., Hyogo, Japan ; Hosaka, N. ; Hashio, K. ; Matsushima, M.
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Macroscopic and microscopic uniformity in 4-inch InP substrates has been significantly improved by new developments in SEI's Vertical Boat (VB) technique. In this paper, we report improvements, in etch-pit density (EPD) distribution, micro-resistivity profiles, and photoluminescence (intensity and 4.2K spectra), for 4-inch InP VB in comparison to both VCZ (SEI proprietary Vapor pressure controlled Chockralski) and commercially available VGF substrates.

Published in:

Gallium Arsenide Integrated Circuit (GaAs IC) Symposium, 2002. 24th Annual Technical Digest

Date of Conference:

20-23 Oct. 2002

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