Description of the fabrication and characteristics of a micromachined metal thin-film pressure sensor for working at high temperatures is presented. The proposed pressure sensor consists of a Cr thin-film, patterned on a Wheatstone bridge configuration, sputter-deposited onto thermally oxidised Si membranes with an Al interconnection layer. This sensor has the advantages of high sensitivity, high temperature operation and is suitable for batch process.
Published in:
Electronics Letters
(Volume:38
,
Issue:
22
)
Date of Publication: 24 Oct 2002