Recently, CMOS devices with 150 GHz fmax have been reported with a 0.18 μm bulk CMOS technology. This paper describes a complete high frequency characterization of MOSFET devices obtained with a 0.13 μm partially-depleted SOI technology, including for the first time microwave noise parameters on 90 nm SOI devices. A high fmax of 150 GHz and a low minimum noise figure of 0.8 dB with an associated gain of 16 dB @ 6 GHz have been obtained @1.2V under low power consumption (7mW).
Published in:
SOI Conference, IEEE International 2002
Date of Conference: 7-10 Oct 2002