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A comparative study of CoZrNb and NiFe targets in discharge and sputtering using plasma confining type of magnetron sputtering method

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3 Author(s)
Takahashi, Takakazu ; Dept. of Electron. & Comput. Eng., Toyama Univ., Japan ; Ikeda, N. ; Naoe, Masahiko

CoZrNb and NiFe films have been deposited by a plasma-confining type magnetron sputtering method which can greatly improve the utilization efficiency of a magnetic alloy target with high permeability and completely suppress the bombardment of the substrate by high-energy γ-electrons. Applying an auxiliary solenoid magnetic field H E perpendicular to the target plane improved the target utilization efficiencies in volume for CoZrNb and NiFe targets from 32 to 51% and from 25 to 41%, respectively. In both targets, the maximum deposition rates were above 0.2 μm/min. All CoZrNb films deposited by this method were composed of FCC-phase crystallites with the NiFe(111) plane parallel to the film plane. When HE was applied to CoZrNb films, the saturation magnetization 4πM s and the coercivity Hc varied from 11.5 to 14 kG and from 0.1 to 0.9 Oe, respectively. For NiFe films, 4πMs and Hc were constants of about 9.5 kG and about 0.5 Oe, respectively

Published in:

Magnetics, IEEE Transactions on  (Volume:26 ,  Issue: 5 )

Date of Publication:

Sep 1990

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