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Current VLSI design techniques focus on four major goals: higher integration, faster speed, lower power, and shorter time-to-market. These goals have been accomplished mainly by deep submicron (DSM) technology along with voltage scaling. However, scaling down of feature size causes larger interwire capacitance which results in large crosstalk between interconnects. In this paper, we propose a novel predictable circuit architecture, named "optimized overlaying array-based architecture" (O/sup 2/ABA), especially suited for the deep submicron regime. O/sup 2/ABA achieves reduction in crosstalk by considering the current directions and by reducing interwire capacitance. The introduction of "unit cell" leads to regularity, which makes the performance predictable even before layout, and shortens design time. O/sup 2/ABA is compared with other design styles, such as custom design and standard cell approach, in terms of coupling capacitance, area, and delay.