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Negative-bias-temperature-instability (NBTI) for p/sup +/-gate pMOSFET with ultra-thin plasma-nitrided gate dielectrics

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8 Author(s)
Shyue-Seng Tan ; Nanyang Technological University ; Tupei Chen ; Chew-Hoe Ang ; Lek, C.-M.
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First Page of the Article

Published in:

Plasma- and Process-Induced Damage, 2002 7th International Symposium on

Date of Conference:

5-7 June 2002