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Non-ferromagnetic Co-C thin films were magnetically patterned by electron-beam direct writing. Co50C50 films with thickness of 30-60 nm were prepared by alternately sputtering Co and C films onto C-buffered glass substrates. The as-deposited Co50C50 films are amorphous and nonferromagnetic. Magnetic patterning of the as-deposited Co50C50 film was realized by subjecting it to electron-beam radiation using a focused 30 keV beam with a current of 6.6 nA and a dwell time per dot of 3.8 s and longer. The smallest magnetic dot diameter produced by a dwell time per dot of 3.8 s is about 270 nm. The magnetic dot diameter increases linearly with the square root of dwell time per dot, which implies that the magnetic dots are produced by heat-conduction-induced phase change in the film. The magnetic measurements show that the dots are magnetically soft. The present nanolithography is potentially a flexible alternative to fabricate patterned magnetic nanostructures for submicrometer magnetic devices.