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Fabrication of 2-D and 3-D silicon photonic crystals by deep etching

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5 Author(s)
Chelnokov, A. ; Inst. d''Electronique Fondamentale, CNRS, Orsay, France ; David, S. ; Kang Wang ; Marty, F.
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Deep etching methods applied to semiconductors allow the fabrication of two-dimensional and three-dimensional photonic crystals. The use of chemical, plasma, and focused ion beam etch applied to silicon is reviewed.

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Selected Topics in Quantum Electronics, IEEE Journal of  (Volume:8 ,  Issue: 4 )