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The deposition and some properties of polycrystalline silicon deposited by thermal decomposition of monosilane in propylene and hydrogen addition

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2 Author(s)
Erkov, V.G. ; Inst. of Phys. Semicond., Acad. of Sci., Novosibirsk, Russia ; Devyatova, S.F.

It was established that monosilane pyrolysis processes with increasing temperature passed from surface to gas phase: the heterogeneous chain radical route predominating at 640°C took heterogeneous-homogeneous chain radical nature at 700°C. At the same time pyrolysis reaction order by propylene decreased from (-1.28±0.02) down to (-0.6±0.02). Propylene and hydrogen were shown to decrease the deposition rate of PS layers band to reduce the portion of monosilane (m) used for PS deposition. The effective activation energy of monosilane pyrolysis processes without and with propylene and hydrogen in gas mixture was determined and was equal to 171±10 kJ/mol, 301±10 kJ/mol, 247±10 kJ/mol respectively. it was established that monosilane pyrolysis processes with increasing temperature passed from surface to gas phase: heterogeneous chain radical route predominating at 640°C took heterogeneous-homogeneous chain radical nature at 700°C.

Published in:

Science and Technology, 2002. KORUS-2002. Proceedings. The 6th Russian-Korean International Symposium on

Date of Conference:

2002