The deposition and some properties of polycrystalline silicon deposited by thermal decomposition of monosilane in propylene and hydrogen addition

It was established that monosilane pyrolysis processes with increasing temperature passed from surface to gas phase: the heterogeneous chain radical route predominating at 640/spl deg/C took heterogeneous-homogeneous chain radical nature at 700/spl deg/C. At the same time pyrolysis reaction order by propylene decreased from (-1.28/spl plusmn/0.02) down to (-0.6/spl plusmn/0.02). Propylene and hydrogen were shown to decrease the deposition rate of PS layers band to reduce the portion of monosilane (m) used for PS deposition. The effective activation energy of monosilane pyrolysis processes without and with propylene and hydrogen in gas mixture was determined and was equal to 171/spl plusmn/10 kJ/mol, 301/spl plusmn/10 kJ/mol, 247/spl plusmn/10 kJ/mol respectively. it was established that monosilane pyrolysis processes with increasing temperature passed from surface to gas phase: heterogeneous chain radical route predominating at 640/spl deg/C took heterogeneous-homogeneous chain radical nature at 700/spl deg/C.