By Topic

Nickel-chrome-iron alloy film deposited by pulsed arc deposition

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Changlong Cai ; Electr. Fac. of Eng., Xi''an Jiaotong Univ., China ; Jimei Wang ; Yixin Yan ; Lingxia Hang
more authors

In this paper, a technique for depositing nickel-chrome-iron alloy film using a pulsed arc deposition is introduced. The plating technique has been developed and the properties of the film deposited with the developed technique are measured. The results show that the difference of composition between the film and cathode material is less than ±3% and by adding an collimating electrode, the uniform transmittance can be achieved over a distance 70 mm on the substrate.

Published in:

Plasma Science, IEEE Transactions on  (Volume:30 ,  Issue: 2 )