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Photoluminescence topography of sulfur doped 2" InP grown by the vertical gradient freeze technique

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2 Author(s)
U. Sahr ; Crystal Growth Lab., Erlangen-Nurnberg Univ., Erlangen ; G. Muller

S-doped InP crystals were grown in a VGF furnace. The substrates, cut from the seed, middle and tail portions of the ingot, were investigated by Hall-measurement, photoluminescence spectroscopy and topography. The photoluminescence intensity across the wafer area is very homogeneous, with an average standard deviation of 6% only. The carrier concentration is measured by evaluating the position of the high-energy cut-off of the band-to-band luminescence. The optical data satisfactorily correlate with Hall measurements.

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Indium Phosphide and Related Materials Conference, 2002. IPRM. 14th

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