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Study of CoNbFe films deposited by DC magnetron sputtering

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3 Author(s)
Pan, G. ; Dept. of Phys., Loughborough Univ. of Technol., UK ; Spencer, A.G. ; Howson, R.P.

CoNbFe films were deposited by DC multisource sputtering and unbalanced DC single-magnetron sputtering. The film structures and magnetic properties were studied as a function of film composition and deposition parameters. Transmission electron microscopy study of the film structure and the measurement of film resistivity showed that films containing more than 12 at.% of Nb are amorphous, with a transition to crystalline films occurring in the 12-9-at.% range. The addition of small amounts of Fe reduces the Hc of the as-deposited films. For Co87-xNb13Fex films, the optimum Fe content is 5.0 at.%. The minimum Hc of CoNbFe films made by the multisource was 17 A/m, with a large anisotropy field Hk. Films made from a composite target on a single unbalanced magnetron had a minimum Hc of 6 A/m and a minimum Hk of 15 A/m. This is attributed to the low-energy and high-density ion bombardment of the growing films and the smaller angle of incidence from the single source

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Magnetics, IEEE Transactions on  (Volume:27 ,  Issue: 1 )