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Small dimension Bragg reflectors formed by air-isolated GaAs layers

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4 Author(s)
Beyler, C.A. ; Center for Photonic. Technol., Univ. of Southern California, Los Angeles, CA, USA ; Hummel, S.G. ; Frateschi, N. ; Dapkus, P.D.

Demonstrates a process for the fabrication of air-isolated microstructures based upon impurity diffusion disordering and selective etching of multilayer structures. The process is illustrated by the fabrication of 5 and 22 mu m wide Bragg reflectors with reflectivities in excess of 95%.

Published in:

Electronics Letters  (Volume:27 ,  Issue: 7 )

Date of Publication:

28 March 1991

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