By Topic

Measurement of static and vibration-induced phase noise in UHF thin-film resonator (TFR) filters

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

6 Author(s)
Birdsall, S.A. ; Electron. Sensors & Syst. Sector, Northrop Grumman Corp., Baltimore, MD, USA ; Dever, P.B. ; Donovan, J.B. ; Driscoll, M.M.
more authors

Measurements of the static phase noise and vibration sensitivity of thin-film resonator (TFR) filters operating at 640 and 2110 MHz have been made. They show that the short-term frequency instability of the filters is small compared with that induced in the oscillator signal by the sustaining stage amplifier PM (phase modulation) noise. In-oscillator measurement of filter performance under vibration indicates that fractional frequency vibration sensitivities (/spl delta/f/sub 0//f/sub 0/) are on the order of several parts in 10/sup -9//g. Because the percentage bandwidth and order (number of poles) of the filters was fairly constant, so was the product of the center frequency and group delay. Thus, the fractional frequency vibration sensitivity of the filters can be expressed alternatively as carrier signal phase sensitivity to vibration. The /spl tau/-/spl omega//sub 0/ product for the filters that were tested was on the order of 300 rad, so that the equivalent phase sensitivity to vibration was approximately 1 grad/g.

Published in:

Ultrasonics, Ferroelectrics, and Frequency Control, IEEE Transactions on  (Volume:49 ,  Issue: 5 )