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Comprehensive and easy to use SEM analysis structures for BiCMOS process development

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1 Author(s)
Leibiger, S. ; Fairchild Semicond. Corp., South Portland, ME, USA

A comprehensive, yet easily used, set of SEM analysis structures is presented. These are currently being used in the development of a 0.35 micron, three layer metal, BiCMOS process flow. A summary list of the structure types and arrangements, key design considerations, SEM photographic results, and recommendations for improvement are included. A key design feature, a unique device navigation system allowing quick and accurate location of any particular structure is explained. Without such a feature, analysis would be difficult due to the large number, lateral size, and similarity of the various constructions.

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Advanced Semiconductor Manufacturing 2002 IEEE/SEMI Conference and Workshop

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