Cart (Loading....) | Create Account
Close category search window
 

Advanced Process Control: benefits for photolithography process control

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

1 Author(s)
Gould, C. ; Infineon Technol. Richmond, Sandston, VA, USA

High volume, cost effective, manufacturing of state of the art lithography processes requires in depth understanding of Process and Process-Tool interaction to achieve Advanced Process Control (APC). The APC systems being deployed at Infineon Technologies, Richmond has shown and is expected to continue demonstrating continuous improvement for the following primary metrics: · OL and CD Cpk · Rework Reduction · Reduction of MTTD · Lot Cycle Time improvement.

Published in:

Advanced Semiconductor Manufacturing 2002 IEEE/SEMI Conference and Workshop

Date of Conference:

2002

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.