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Summary form only given. Conventional electron beam lithography (EBL) has been used for fabricating patterned nanostructure, however, it involves the cumbersome process of resist coating, etching, lift-off, etc., which greatly complicates the production of patterned nanostructures. Mask-assistant ion beam mixing of multilayer films has been proposed but demonstrated low-resolution. A novel method involving direct magnetic patterning of a non-magnetic film by e-beam radiation induced nano-scale phase change is proposed in this paper, and preliminary results are presented. Metastable amorphous Co-C thin films were selected for this study.
Date of Conference: April 28 2002-May 2 2002