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Reclamation of waste mixture of sulfuric acid and hydrogen peroxide used to clean semiconductor wafers

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2 Author(s)
Inagaki, Y. ; Tech. Support Center, Sony Corp., Yokohama, Japan ; Nishizaki, M.

The mixture of sulfuric acid and hydrogen peroxide, or the so-called piranha, used to clean semiconductor wafers generally requires considerable water and chemicals to allow it to be discharged as wastewater and sludge. We have developed a new method of converting the waste mixture into concentrated sulfuric acid, decomposing the hydrogen peroxide in the waste mixture and adding a trace of nitric acid. This method allows the waste mixture to be reused and the amount of water and chemicals required for treating the waste to be reduced

Published in:

Semiconductor Manufacturing Conference Proceedings, 1999 IEEE International Symposium on

Date of Conference:

1999

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