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Improved electrical characteristics of CoSi2 using HF-vapor pretreatment

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6 Author(s)
Wu, Y.H. ; Dept. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan ; Chen, W.J. ; Chang, S.L. ; Chin, Albert
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We have developed a simple process to form epitaxial CoSi/sub 2/ for shallow junctions. Prior to metal deposition, the patterned wafers were treated with HF-vapor passivation. As observed by scanning tunneling microscopy (STM), this HF treatment drastically improves the native oxide-induced surface roughness. The epitaxial behavior was confirmed by cross-sectional transmission electron microscopy (TEM). Decreased sheet resistance and leakage current, and improved thermal stability are displayed by the HF treated samples, which is consistent with STM and TEM results.

Published in:

Electron Device Letters, IEEE  (Volume:20 ,  Issue: 7 )