A practical methodology that can be applied to optimize the process yield of IC fabrication lines is described. The yield maximization problem is first reformulated into a deterministic design centering problem. Macromodeling and problem decomposition are then applied to solve the design centering problem efficiently. The effectiveness of this methodology is illustrated through a simulation example involving a CMOS process adopted from an industrial line.<
Published in:
Computer-Aided Design, 1989. ICCAD-89. Digest of Technical Papers., 1989 IEEE International Conference on
Date of Conference: 5-9 Nov. 1989