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Batch size optimization of a furnace and pre-clean area by using dynamic simulations

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4 Author(s)
Rulkens, H.J.A. ; Dept. of Production Control, Philips Semicond., Netherlands ; Van Campen, E.J.J. ; Van Herk, J. ; Rooda, J.E.

A dynamic simulation model is a powerful and fast tool to analyze existing production situations and to optimize the performance by evaluating alternative scheduling rules. This paper presents such an analysis and optimization for a furnace and pre-clean area of a wafer fab. The design of a dynamic model is described. Furthermore, experiments are described that illustrate the influence of a minimum batch size scheduling rule. For a specific production situation, the minimum batch sizes per furnace process which optimize cycle time are determined

Published in:
Advanced Semiconductor Manufacturing Conference and Workshop, 1998. 1998 IEEE/SEMI

Date of Conference: 23-25 Sep 1998

Page(s):
439 - 444
Meeting Date :
23 Sep 1998-25 Sep 1998
ISSN :
1078-8743
Print ISBN:
0-7803-4380-8
INSPEC Accession Number:
6239954
Conference Location :
Boston, MA
Digital Object Identifier :
10.1109/ASMC.1998.731643
Product Type:
Conference Publications

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