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Lamp configuration design for rapid thermal processing systems

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2 Author(s)
Yaw-Kuen Jan ; Dept. of Control Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan ; Ching-An Lin

We have studied lamp configuration design for rapid thermal processing (RTP) systems. We considered a configuration consisting of four concentric circular lamp zones, three of them above the wafer and one circumventing the wafer. We propose a method to determine the geometric parameters, the width, height and radius, of the lamp zones so that the configuration designed has the capacity to achieve a uniform temperature on the wafer. The method is based on a necessary and sufficient condition for uniform temperature tracking and analytic expressions of the view factors. A design example is given in which a least square open-loop control law yields good temperature uniformity

Published in:

Semiconductor Manufacturing, IEEE Transactions on  (Volume:11 ,  Issue: 1 )

Date of Publication:

Feb 1998

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