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Reduction of gaseous contamination by UV/photoelectron method

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8 Author(s)
Tobimatsu, Hiroshi ; Res. Center for Nanodevices & Syst., Hiroshima Univ., Japan ; Inoue, Yuuki ; Seto, Takafumi ; Okuyama, Kikuo
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We have previously reported that UV/photoelectron method, in which particles are charged by photoelectrons emitted from the UV irradiated metal surface and collected on the electrodes by the electric field, is effective to collect particles in the gas phase. This paper represents that the UV/photoelectron method is effective not only to collect particles but also to reduce the gaseous contamination such as hydrocarbon or organic compounds and water molecules. By using the UV/photoelectron method the carbon atom concentration on the Si surface is reduced to 1/4 compared with that stored in the clean room for the storage period of about 40 h. The oxygen concentration is reduced to 1/7 in the same condition

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Semiconductor Manufacturing, IEEE Transactions on  (Volume:11 ,  Issue: 1 )