By Topic

Application of a bitmap analysis system to the forefront of DRAM devices development

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
Hamada, T. ; Evaluation Technol. Dept., NEC Corp., Kawasaki, Japan ; Sugimoto, M.

A bitmap analysis system with a shape classification has been developed for use in manufacturing of forefront DRAM devices. This system shortens the time needed to improve the processing conditions according to the results of failure analysis. This system is a part of a total yield enhancement system have already been put to practical use in mass production

Published in:

Advanced Semiconductor Manufacturing Conference and Workshop, 1997. IEEE/SEMI

Date of Conference:

10-12 Sep 1997