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CMOS Photodetectors Integrated With Plasmonic Color Filters

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6 Author(s)
Qin Chen ; School of Engineering, University of Glasgow, Glasgow, U.K. ; Danial Chitnis ; Kirsty Walls ; Tim D. Drysdale
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A single-pixel plasmonic complementary metal oxide semiconductor (CMOS) photo sensor consisting of a plasmonic color filter integrated on a CMOS photodiode was fabricated using electron beam lithography and dry etch. The photocurrent measurement results confirmed the three primary color filtering responses that could be achieved in a single layer of nanostructured aluminium film. Finite-difference time-domain simulation demonstrated a good agreement of the reflection spectra with the measured result. This research can lead to the development of advanced CMOS image sensors with low cost and low crosstalk.

Published in:

IEEE Photonics Technology Letters  (Volume:24 ,  Issue: 3 )