By Topic

Dynamic management of controls in semiconductor manufacturing

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Munga, J.N. ; Centre Microelectron. de Provence, Ecole des Mines de St.-Etienne, Gardanne, France ; Dauzere-Peres, S. ; Vialletelle, P. ; Yugma, C.

In order to optimize the number of controls in semiconductor manufacturing, a Permanent Index per Context (IPC) has been developed to evaluate in real-time the risk on production tools. Depending on the context which can be defined at tool level, chamber level or recipe level, the IPC allows a very large amount of data to be managed and helps to compute global risk indicators on production. A prototype based on the IPC has been developed and deployed for the CMP workshop. Results show that various indicators can be determined in real time to control risks. The number of measurements without actual added value can be strongly reduced. Moreover, the dispatching of lots on production tools can be improved.

Published in:

Advanced Semiconductor Manufacturing Conference (ASMC), 2011 22nd Annual IEEE/SEMI

Date of Conference:

16-18 May 2011