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Etching quartz crystals in anhydrous HF gas

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4 Author(s)

Exposing quartz crystals to anhydrous HF gas at 400°C results in a high density of helical etch channels, a white crusty surface, and other unusual features. The treatment results in a negligible thickness change. There is no similarity between the characteristics of these helical etch channels and the conventional etch channels produced by liquid etchants, nor is there a correlation between the incidence of helical etch channels and the type of quartz, or the surface finish. Exposure of quartz blanks to HF/H2O vapors emanating from a 49% aqueous HF solution at ~20°C resulted in conventional etch channels, faceting, and measurable frequency changes, indicating that the presence or absence of water is responsible for the differences in etching behaviors

Published in:

Frequency Control Symposium, 1996. 50th., Proceedings of the 1996 IEEE International.

Date of Conference:

5-7 Jun 1996

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