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X-ray lathe: An X-ray lithographic exposure tool for nonplanar objects

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4 Author(s)
A. D. Feinerman ; Dept. of Electr. Eng. & Comput. Sci., Illinois Univ., Chicago, IL, USA ; R. E. Lajos ; V. White ; D. D. Denton

An X-ray lithography lathe has been developed that can pattern cylindrical, ellipsoidal, and other nonplanar objects. This lathe is capable of patterning on a micron scale a wide variety of shapes including shapes impossible to achieve with a conventional lathe. A cylindrical core covered with a suitable resist is rotated while being exposed with a collimated X-ray source through a mask. The mask absorbs X rays up to a particular radius from the center of the core and the resist beyond that radius is removed in a developer. Several cylindrical cores were coated with poly(methylmethacrylate) (PMMA) 5 to 125 μm thick and patterned with X-rays down to a 250-μm horizontal scale (along the lathe axis). The exposure time for a cylindrical PMMA layer is ~three-four times longer than a planar layer with the same thickness. The capabilities of this technology, lathe apparatus, dose calculations, and initial exposure results are described

Published in:

Journal of Microelectromechanical Systems  (Volume:5 ,  Issue: 4 )