By Topic

Grayscale lithography by a polymer photomask doped with laser dye

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Korivi, N.S. ; Department of Electrical and Computer Engineering, Louisiana State University, Baton Rouge, Louisiana 70803-5901 ; Zhou, Y.X. ; Jiang, L.

Your organization might have access to this article on the publisher's site. To check, click on this link: 

This article reports on the development of a novel grayscale photomask which operates on the basis of differential absorption of ultraviolet (UV) light in photoabsorbing material. The developed photomask is made of a patterned, moldable polymer (polydimethylsiloxane) doped with a laser dye (Coumarin 314). The doped polymer functions as photoabsorbing material. Due to the moldable nature of polydimethylsiloxane, micro- and nanostructures can be created on its surface from a complementary mold relief. By adjusting the thickness of patterns formed on the photomask, concentration of the dye in the polymer, and UV exposure dose, a multitude of unique multidimensional microstructures can be fabricated with desired geometries and dimensions. Using the developed polymer photomask with a standard UV source, three-dimensional microstructures with different heights have been formed in positive photoresist by a single UV exposure step. This method is inexpensive compared to other grayscale lithography techniques and relatively easy to implement due to its process simplicity.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:26 ,  Issue: 1 )