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B diffusion in Si with pre-amorphization of different species

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4 Author(s)
Li, Hong-Jyh ; International SEMATECH, 2706 Montopolis Drive, Austin, Texas 78741 ; Zeitzoff, P. ; Larson, L. ; Banerjee, Sanjay

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.1795250 

Boron diffusion in Si in shallow pre-amorphization implants (SPAI) of different species, including F, Ge, GeF2, BF2, and their combination was studied. Results show that different species have different impact on B diffusion. In addition to the chemical effect, the interaction of SPAI species with B, leading to immobile B clustering, is another important cause for B diffusion reduction. Fluorine is more effective than Ge in the B diffusion reduction. Adding more F in the amorphous region results in more B diffusion reduction. Aside from the effect on the B diffusion, fluorine itself manifests a large amount of out-diffusion for the shallow F implant case and as F is implanted deeper, a bell-shaped F profile exists around the end-of-range damage. The out-diffusion of F is further enhanced by the implanted damage.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:22 ,  Issue: 5 )

Date of Publication:

Sep 2004

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