Skip to Main Content
Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.1690249
The problem of in situ monitoring the film thickness by quartz microbalance during vacuum deposition of organic-molecular semiconductors is addressed herein by setting a procedure for sensor calibration based on ex situ analysis of the deposited molecular film by atomic-force microscopy measurements. The procedure is applied to the growth of molecular-organic thin films on silica. Some physical parameters of the materials are deduced. © 2004 American Vacuum Society.
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films (Volume:22 , Issue: 3 )
Date of Publication: May 2004