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Influence of grain size on the transport properties of Ni80 Fe20 and Cu thin films

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8 Author(s)

The conductivity of sputtered Ta/Cu/Ta and Ta/Ni80Fe 20/Ta thin films was measured for a film thickness ranging from 20 to 1500 Å. The measured data were analyzed using a semi-classical model for the electron transport, that includes grain boundary scattering, It was found that in these films grain boundaries are an important source of electron scattering, in Ni80Fe20 leading to an effective spin dependence of the scattering which is considerably. Smaller than the intrinsic spin dependence of the scattering

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Magnetics, IEEE Transactions on  (Volume:31 ,  Issue: 6 )