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In this paper, a thermal lithography technique was proposed for fabricating nanometer-sized structures. Using Ge-Sb-Cr-O (GSCO) materials with blue laser of 405 nm by thermal lithography technique, a minimum space width of approximately 140 nm which is far beyond the diffraction limit of 320 nm was fabricated. The pattern size can be obtained with different illuminating laser powers to meet requirements of the industry. In case of obtaining the width of nanoscale patterns smaller than 140 nm, the wavelength of exposure light smaller than blue laser is required.