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New hot-carrier-degradation mode in thin-film SOI nMOSFET's

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2 Author(s)
Tsuchiya, T. ; NTT LSI Labs., Kanagawa, Japan ; Ohno, T.

A new hot-carrier degradation mode peculiar to MOSFET's fabricated on thin-film SOI is described. This degradation mode, which occurs in nMOSFET's more easily than in pMOSFET's, is due to suppression of parasitic bipolar action caused by recombination of excess carriers through hot-carrier-induced front interface-traps. Threshold voltage is significantly shifted by this phenomenon. The reliability lifetime defined by threshold voltage shift and drain current degradation is also discussed, considering the new degradation mode.<>

Published in:

Electron Device Letters, IEEE  (Volume:16 ,  Issue: 10 )