Referenced Items are not available for this document.
Nanoimprint lithography has been demonstrated as a high-throughput, high-resolution and low-cost manufacturing method on nano scale pattering since it was first proposed by Dr. S.Y. Chou in 1995. In this article we presented a general literature review on the roller-type nanoimprint tithography (RNIT), a continuous nanoimprint lithography process. Several kinds of typical Roller-type Nanoimprint Lithography process have been briefly introduced and some examples are also introduced to gain a clear general view and perceive.
Published in:
Smart Manufacturing Application, 2008. ICSMA 2008. International Conference on
Date of Conference: 9-11 April 2008
- Page(s):
- 371 - 376
- E-ISBN :
- 978-89-962150-0-4
- Print ISBN:
- 978-89-950038-8-6
- INSPEC Accession Number:
- 10028885
- Conference Location :
- Gyeonggi-do
- Digital Object Identifier :
- 10.1109/ICSMA.2008.4505555
- Product Type:
- Conference Publications
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