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Nanoimprint lithography has been demonstrated as a high-throughput, high-resolution and low-cost manufacturing method on nano scale pattering since it was first proposed by Dr. S.Y. Chou in 1995. In this article we presented a general literature review on the roller-type nanoimprint tithography (RNIT), a continuous nanoimprint lithography process. Several kinds of typical Roller-type Nanoimprint Lithography process have been briefly introduced and some examples are also introduced to gain a clear general view and perceive.
Date of Conference: 9-11 April 2008