By Topic

In-Situ Measurement of Supply-Noise Maps With Millivolt Accuracy and Nanosecond-Order Time Resolution

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

8 Author(s)
Kanno, Y. ; Central Res. Lab., Hitachi, Ltd, Tokyo ; Kondoh, Y. ; Irita, T. ; Hirose, K.
more authors

An in situ measurement scheme for generating supply-noise maps, which can be conducted while running applications in product-level LSIs, was developed. The design of the on-chip voltage sampling probe is based on a simple ring oscillator, which converts local supply difference between VDD and VSS to oscillation-frequency deviation. High measurement accuracy is achieved by off-chip digital signal processing and calibration. This scheme was used to successfully measure 69-mV local supply noise with 5-ns time resolution in a 3G-cellular-phone processor. It will thus help in designing power-supply networks and in visually verifying the quality of a power supply

Published in:

Solid-State Circuits, IEEE Journal of  (Volume:42 ,  Issue: 4 )