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Cesium hydroxide (CsOH): a useful etchant for micromachining silicon

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3 Author(s)
Clark, L.D., Jr. ; MIT, Cambridge, MA, USA ; Lund, J.L. ; Edell, D.J.

The CsOH-H/sub 2/O etchant system was studied over a range of concentrations (10%-76% by weight) and temperatures (25-90 degrees C). The etch rates of

Published in:

Solid-State Sensor and Actuator Workshop, 1988. Technical Digest., IEEE

Date of Conference:

6-9 June 1988