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Control chart techniques for high volume, multiple process wafer fabrication areas

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1 Author(s)
T. Bassett ; Signetics Corp., Sunnyvale, CA, USA

Control chart format and response to out-of-control conditions are examined. The main emphasis is on control charting pragmatism, simplicity, and cost effectiveness. Although several basic statistical tools are referenced, the control chart as a `current time, operation driven, historically succinct, online process control tool', is the main focus. Control chart data log consolidation, z-normalization, fat targeting, sensor numbers, and symbolism are reviewed, with actual examples from the fabrication area to demonstrate design and modification of these simple, inexpensive, and powerfully effective statistical tools. Examples come from the traditional process parametrics, contamination control, product/inventory flow, and online statistical maintenance control applications

Published in:

Advanced Semiconductor Manufacturing Conference and Workshop, 1991. ASMC 91 Proceedings. IEEE/SEMI 1991

Date of Conference:

21-23 Oct 1991