By Topic

A monitoring and diagnostics system for a plasma etching cell

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
J. R. Moyne ; Solid-State Electron. Lab., Michigan Univ., Ann Arbor, MI, USA ; H. Etemad ; N. Najafi

A three-level process monitoring and diagnostics system has been developed for a plasma etching cell. The physical and logical layout of this system is designed to co-exist with a proposed hierarchical cell control system. The cell control system design incorporates generic cell controller concepts and some of the SEMI Generic Equipment Model (GEM) specifications. At the lowest level of the system, equipment and process parameter monitoring is achieved. An AT-compatible computer serves as an information collection/router agent as well as an interpreter (gateway) between the SECS/RS-232 formatted messages received from the equipment controller system and the higher-level expert systems commands. At the top of the hierarchy, an expert systems package that resides on a SUN SPARC station and operates on an X-Windows environment collects information on the equipment and process from the AT compatible. The many system capabilities that result include: (1) pseudo real-time equipment and process monitoring, (2) equipment diagnostics and alarm reporting, (3) alarm logging; and (4) real-time equipment control

Published in:

Advanced Semiconductor Manufacturing Conference and Workshop, 1991. ASMC 91 Proceedings. IEEE/SEMI 1991

Date of Conference:

21-23 Oct 1991