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Advanced Process Monitoring and Control Methods for Poly Gate CD Targeting

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6 Author(s)
Underwood, J. ; Freescale Semicond., Inc., Austin, TX ; Gray, J. ; Shepherd, N. ; Caldwell, M.
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Accurate poly critical dimension (CD) control is necessary to run speed-sensitive parts in high volume production. A source-of-variation study indicated that poly CD variation accounted for over 50% of end-of-line variation in speed and power for a critical production part. A team was established to implement process control methodologies to reduce poly CD variation. The team took a module-based approach - linking outputs from the lithography, etch, and implant areas to form the tightest possible control for optimal product performance

Published in:

Advanced Semiconductor Manufacturing Conference, 2006. ASMC 2006. The 17th Annual SEMI/IEEE

Date of Conference:

22-24 May 2006

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