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Application of on-chip MIM decoupling capacitor for 90nm SOI microprocessor

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22 Author(s)
Roberts, D. ; Freescale Semicond. Inc., Austin, TX ; Johnstone, W. ; Sanchez, H. ; Mandhana, O.
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A reliable metal-insulator-metal (MIM) capacitor exceeding 250nF has been integrated into the copper/low-K backend of a high-performance 90nm SOI technology. The reduction of supply grid voltage transients has enhanced microprocessor performance by approximately 10% without increasing the chip area or power consumption

Published in:

Electron Devices Meeting, 2005. IEDM Technical Digest. IEEE International

Date of Conference:

5-5 Dec. 2005