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Nanopatterning with interferometric lithography using a compact λ=46.9-nm laser

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10 Author(s)
Capeluto, M.G. ; Dept. de Fisica, Univ. de Buenos Aires, Argentina ; Vaschenko, G. ; Grisham, M. ; Marconi, M.C.
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We report the imprinting of nanometer-scale gratings by interferometric lithography at λ=46.9 nm using an Ne-like Ar capillary discharge laser. Gratings with periods as small as 55 nm were imprinted on poly-methyl methacrylate using a Lloyd's mirror interferometer. This first demonstration of nanopatterning using an extreme ultraviolet (EUV) laser illustrates the potential of compact EUV lasers in nanotechnology applications.

Published in:

Nanotechnology, IEEE Transactions on  (Volume:5 ,  Issue: 1 )

Date of Publication:

Jan. 2006

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