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3D diffuser lithography: a novel method to fabricate various rounded microstructures

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2 Author(s)
Sung-Il Chang ; Dept. of Electr. Eng. & Comput. Sci., KAIST, South Korea ; Jun-Bo Yoon

In this work, we developed a novel method to fabricate various rounded microstructures by using simply a diffuser in the conventional lithography step (so-called 3D diffuser lithography). Using this method, we demonstrated circular as well as elliptical microstructures in a thick photoresist and PDMS microlens arrays. Furthermore, we obtained the high-density photoresist patterns formed by simply decreasing the spacing between the photoresist patterns, which was used for the high fill-factor microlens array. Also, various possible MEMS applications with rounded microstructures such as microswitches and microshutters were proposed.

Published in:

Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05. The 13th International Conference on  (Volume:2 )

Date of Conference:

5-9 June 2005