This paper deals with the design, processing, and electrical characteristics of a new monolithic power device comprising a V.MOS Field-Effect-Transistor as the driver component, and a bipolar low Emitter Concentration Transistor as the power output component. The study of the device has been made on the base of a 3,9 × 3,9 mm2chip. The device design is such that there is a complete compatibility between processing of the multiepitaxial bipolar power transistor and of the V.MOS transistor. The influence of the main parameters of the structure was studied, including : - Channel width of the V.MOS - Gate oxide thickness - Characteristics of the epitaxial layers A diffusion processing insuring a high gain for the bipolar transistor and a low threshold voltage of the V.MOS F.E.T. has been developed. The electrical measurements exhibit nice characteristics for medium voltage applications: - low threshold voltage : V
Published in:
Electron Devices Meeting, 1980 International
(Volume:26
)
Date of Conference: 1980