Cart (Loading....) | Create Account
Close category search window
 

Chamber cleaning process selection for installed-base CVD tools

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Blundo, F. ; ST Microelectronics, Catania ; Alberghina, M. ; Frazzica, M. ; Loh, G.
more authors

This study presents a c-C4F8 based chamber cleaning chemistry as an opportunity that has both process and ESH benefits with minimal cost and process modifications. c-C4F 8 was identified based on a balanced approach. The benefits of c-C4F8 compared to the C3F8 cleaning process were estimated to justify this work. Several factors related to cost and SHE were evaluated. Some issues pertaining to the cleaning gas delivery were considered. Previously optimized c-C 4F8 recipes were used to minimize the c-C4 F8 recipe development work. FTIR and optical emission endpoint detector were used to verify the completion of chamber cleaning, and the reductions in PFC emissions. The results indicated that the c-C4F8 cleaning process reduced PFC emission by 57%, compared to our current C3F8 cleaning process. Reduced gas consumption also enabled 20% cost saving on cleaning gas. This work demonstrated a low cost and low effort approach to reduce PFC emissions in installed-base tools

Published in:

Advanced Semiconductor Manufacturing Conference and Workshop, 2005 IEEE/SEMI

Date of Conference:

11-12 April 2005

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.