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Step and flash nanoimprint lithography in Europe

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3 Author(s)
H. Schulz ; Carl Zeiss NTS GmbH, Oberkochen, Germany ; H. Pavlicek ; N. Reng

Nanoimprint lithography is a technology which has been developed during the last decade for achieving structures in the nanometer range. The authors show a short overview of the mainstream processes and work out the advantages of the step and flash imprint lithography (S-FIL). Process results reached at Molecular Imprint Inc. (MII), Austin, Texas, confirm these theses. A comparison is done between optical lithography and the different imprint techniques. Thereby (S-FIL) is the most attractive technology enabling low cost lithography in the nanometer range.

Published in:

Nanotechnology, 2004. 4th IEEE Conference on

Date of Conference:

16-19 Aug. 2004