By Topic

Interval-valued reduced order statistical interconnect modeling

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
J. D. Ma ; Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA ; R. A. Rutenbar

We show how recent advances in the handling of correlated interval representations of range uncertainty can be used to predict the impact of statistical manufacturing variations on linear interconnect. We represent correlated statistical variations in RLC parameters as sets of correlated intervals, and show how classical model order reduction methods - AWE and PRIMA - can be re-targeted to compute interval-valued, rather than scalar-valued reductions. By applying a statistical interpretation and sampling to the resulting compact interval-valued model, we can efficiently estimate the impact of variations on the original circuit. Results show the technique can predict mean delay with errors between 5-10%, for correlated RLC parameter variations up to 35%.

Published in:

Computer Aided Design, 2004. ICCAD-2004. IEEE/ACM International Conference on

Date of Conference:

7-11 Nov. 2004